Study of surface reactions during atomic layer deposition using in situ infrared spectroscopy

被引：0
|
作者：
Chaukulkar, Rohan P. [1 ]
Thissen, Nick [2 ]
Rai, Vikrant R. [1 ]
Agarwal, Sumit [1 ]
机构：
[1] Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA
[2] Eindhoven Univ Technol, NL-5600 MB Eindhoven, Netherlands
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2011年 / 242卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
206-COLL
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页数：1
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