Deposition of polyethylene thin films using synchrotron radiation ablation

被引：11
|
作者：
Nakanishi, K
Suzuki, H
Katoh, T
Imai, S
Nakayama, Y
Miki, H
机构：
[1] Ritsumeikan Univ, Kusatsu 5258577, Japan
[2] Sumitomo Heavy Ind Ltd, Tanashi, Tokyo 4418585, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 2A期
关键词：
polyethylene; ablation; synchrotron radiation; photoexcitation process; thin film;
D O I：
10.1143/JJAP.38.863
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Crystalline polyethylene thin films were deposited on Si substrates using the synchrotron radiation(SR) ablation method. The deposited films were characterized by X-ray diffraction and Fourier-transform infrared spectroscopy. In order to understand the mechanism for the decomposition that occurs due to SR ablation, analysis of gases resulting from the decomposition was performed using the quadrupole mass spectrometric method. The mechanism involved in the carbonization was clarified.
引用
收藏
页码：863 / 867
页数：5
相关论文
共 50 条
  • [1] Deposition of functional carbon compound thin films by synchrotron radiation ablation
    Miki, H
    Lin, S
    Sasaki, M
    Katoh, T
    Imai, S
    Nakayama, Y
    [J]. DIAMOND AND RELATED MATERIALS, 2001, 10 (3-7) : 937 - 941
  • [2] Deposition of poly-p-phenylene thin films by synchrotron radiation ablation
    Suzuki, H
    Nakanishi, H
    Katoh, T
    Imai, S
    Kawaguchi, A
    Nakayama, Y
    Miki, H
    [J]. KOBUNSHI RONBUNSHU, 2000, 57 (02) : 86 - 94
  • [3] Deposition of Teflon-polymer thin films by synchrotron radiation photodecomposition
    Katoh, T
    Zhang, Y
    [J]. APPLIED SURFACE SCIENCE, 1999, 138 : 165 - 168
  • [4] Deposition of Teflon-polymer thin films by synchrotron radiation photodecomposition
    Sumitomo Heavy Industries Ltd., 2-1-1 Yatocho, Tanashi, Tokyo 188-8585, Japan
    [J]. Appl Surf Sci, 1-4 (165-168):
  • [5] Deposition of highly oriented Teflon thin films by synchrotron radiation etching
    Zhang, Y
    Katoh, T
    Endo, A
    [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2001, 119 (2-3) : 247 - 253
  • [6] Deposition of thin films by laser ablation
    Thareja, RK
    Dwivedi, RK
    Misra, A
    Mitra, A
    Neogi, A
    [J]. METALS MATERIALS AND PROCESSES, 1998, 10 (03): : 217 - 230
  • [7] Characterisation of thin films of organic phosphorescent materials using synchrotron radiation
    Thompson, J
    Arima, V
    Matino, F
    Cingolani, R
    Blyth, RIR
    [J]. APPLIED SURFACE SCIENCE, 2005, 248 (1-4) : 36 - 39
  • [8] High-rate anisotropic ablation and deposition of polytetrafluoroethylene using synchrotron radiation process
    Inayoshi, M
    Ikeda, M
    Hori, M
    Goto, T
    Hiramatsu, M
    Hiraya, A
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (12B): : L1675 - L1677
  • [9] Magnetostrictive thin films by laser ablation deposition
    Jenner, AG
    Stone, LA
    Snelling, HV
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 1997, 258 (1-2) : 138 - 142
  • [10] Pulsed laser ablation and deposition of thin films
    Catherinot, A
    Champeaux, C
    Angleraud, B
    Marchet, P
    [J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1998, 53 (287): : 284 - 302
12345