A ferromagnetic resonance study of NiFe alloy thin films

被引:36
|
作者
Díaz de Sihues, M. [1 ]
Durante-Rincón, C. A. [1 ]
Fermin, J. R. [1 ]
机构
[1] Univ Zulia, Fac Ciencias, Dept Fis, Zulia 4001, Venezuela
关键词
magnetic thin film; magnetic anisotropy; ferromagnetic resonance; angular dispersion;
D O I
10.1016/j.jmmm.2007.02.181
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
NiFe alloy films with thicknesses in the range from 60 to 150 angstrom were sputtered onto Si ( 0 0 1) wafers by DC magnetron sputtering, and then characterized by in-plane ferromagnetic resonance technique ( FMR) at x-band. The FMR field ( H-R) and linewidth ( DH) were studied as a function of the in-plane angle, phi(H) film thickness, t, and temperature, T. The main effects of temperature on the magnetic properties of these. lms is to increase the in-plane uniaxial anisotropy and to induce a surface anisotropy that pushes the magnetization out-of-plane. These anisotropies were found to vary with thickness and temperature. The main processes that determine the line broadening are the intrinsic conduction mechanism and the in-plane uniaxial dispersions. (c) 2007 Elsevier B. V. All rights reserved.
引用
收藏
页码:E462 / E465
页数:4
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