Biofilm control in water by advanced oxidation process (AOP) pre-treatment: effect of natural organic matter (NOM)

被引:15
|
作者
Lakretz, Anat [1 ]
Ron, Eliora Z. [2 ]
Harif, Tali [3 ]
Mamane, Hadas [1 ]
机构
[1] Tel Aviv Univ, Fac Engn, Sch Mech Engn, IL-69978 Tel Aviv, Israel
[2] Tel Aviv Univ, Fac Life Sci, Dept Mol Microbiol & Biotechnol, IL-69978 Tel Aviv, Israel
[3] Atlantium LTD, IL-99100 Har Tuv Ind Pk, Israel
关键词
advanced oxidation; biofouling; disinfection; hydrogen peroxide; NOM; ultraviolet; UV/H2O2 ADVANCED OXIDATION; ESCHERICHIA-COLI; UV; DISINFECTION; IMPACT; INACTIVATION;
D O I
10.2166/wst.2011.077
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The main goal of this study was to examine the influence of natural organic matter (NOM) on the efficiency of H2O2/UV advanced oxidation process (AOP) as a preventive treatment for biofilm control. Pseudomonas aeruginosa PAO1 biofilm-forming bacteria were suspended in water and exposed to various AOP conditions with different NOM concentrations, and compared to natural waters. H2O2/UV prevented biofilm formation: (a) up to 24 h post treatment - when residual H2O2 was neutralized; (b) completely (days) - when residual H2O2 was maintained. At high NOM concentrations (i.e. 25 mg/L NOM or 12.5 mg/L DOC) an additive biofilm control effect was observed for the combined H2O2/UV system compared to UV irradiation alone, after short biofilm incubation times (<24 h). This effect was H2O2 concentration dependent and can be explained by the high organic content of these water samples, whereby an increase in NOM could enhance (OH)-O-center dot production and promote the formation of additional reactive oxygen species. In addition, maintaining an appropriate ratio of bacterial surviving conc.: residual H2O2 conc. post-treatment could prevent bacterial regrowth and biofilm formation.
引用
收藏
页码:1876 / 1884
页数:9
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