Plasmonic reflection grating back contacts for microcrystalline silicon solar cells

被引：113

作者：

Paetzold, U. W. ^{[1
]}

Moulin, E. ^{[1
]}

Michaelis, D. ^{[2
,3
]}

Boettler, W. ^{[1
]}

Waechter, C. ^{[2
]}

Hagemann, V. ^{[3
]}

Meier, M. ^{[1
]}

Carius, R. ^{[1
]}

Rau, U. ^{[1
]}

机构：

[1] Forschungszentrum Juelich GmbH, Photovolta IEK5, D-52425 Julich, Germany

[2] Fraunhofer Inst Angew Opt & Feinmech, D-07745 Jena, Germany

[3] Schott AG, D-55122 Mainz, Germany

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 18期

关键词：

D O I：

10.1063/1.3657513

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the fabrication and optical simulation of a plasmonic light-trapping concept for microcrystalline silicon solar cells, consisting of silver nanostructures arranged in square lattice at the ZnO:Al/Ag back contact of the solar cell. Those solar cells deposited on this plasmonic reflection grating back contact showed an enhanced spectral response in the wavelengths range from 500 nm to 1000 nm, when comparing to flat solar cells. For a particular period, even an enhancement of the short circuit current density in comparison to the conventional random texture light-trapping concept is obtained. Full three-dimensional electromagnetic simulations are used to explain the working principle of the plasmonic light-trapping concept. (C) 2011 American Institute of Physics. [doi:10.1063/1.3657513]

引用

页数：3

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