Effect of pretreatment methods and chamber pressure on morphology, quality and adhesion of HFCVD diamond coating on cemented carbide inserts

被引:47
|
作者
Sarangi, S. K. [2 ]
Chattopadhyay, A. [1 ]
Chattopadhyay, A. K. [1 ]
机构
[1] Indian Inst Technol, Dept Mech Engn, Kharagpur 721302, W Bengal, India
[2] Univ Coll Engn, Burla 768018, Sambalpur, India
关键词
HFCVD; pressure; morphology; adhesion;
D O I
10.1016/j.apsusc.2007.10.104
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In the present investigation, diamond coating was deposited on cemented carbide substrate by hot filament chemical vapour deposition. The effect of substrate pretreatment methods and chamber pressure on morphology, quality, and adhesion of the diamond film were studied. The carbide inserts were pretreated with acid, Murakami's solution, and Murakami's solution followed by acid, respectively. The chamber pressure was set at 6.6, 13.2, 26.4, 39.6 and 66 mbar. Deposition carried out at pressure of 26.4 and 39.6 mbar on inserts pretreated with acid exhibited uniform crystal habit and provided coating-substrate adhesion adequate for machining application. Good coating morphology was obtained when deposition was done at 6.6 mbar on carbide inserts treated with Murakami's solution. Pretreatment with Murakami's solution followed by acid and deposition at 6.6 mbar also resulted in good morphology of diamond film. Indentation (Rockwell C scale) was done on diamond-coated inserts to assess coating-substrate adhesion under three loads of 294, 588 and 980 N. The diameter of the indentation crack at the coating-substrate interface was observed under SEM. The results suggested that diamond coating deposited at medium pressure of 26.4 mbar on carbide substrate treated with acid not only exhibited best morphology but also highest coating-substrate adhesion and improved machining performance. (C) 2008 Published by Elsevier B. V.
引用
收藏
页码:3721 / 3733
页数:13
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