Defect evolution during growth of SiC crystals

被引:13
|
作者
Wu, Ping [1 ]
Yoganathan, Murugesu [1 ]
Zwieback, Ilya [1 ]
机构
[1] II VI Inc, WBG, Pine Brook, NJ 07058 USA
关键词
defects; single-crystal growth; silicon carbide;
D O I
10.1016/j.jcrysgro.2007.11.078
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
SiC single crystals grown by sublimation exhibit relatively high dislocation densities and often contain a network of slightly misoriented grains. In order to understand the evolution of dislocation structures and grain boundaries during growth, we studied wafers sliced from different parts of the sublimation-grown SiC single crystals. The wafers have been characterized using imaging with crossed-polarizing filters, etching in molten KOH, optical microscopy and X-ray rocking curves. It was found that in the growth direction from the seed towards the boule dome the dislocation density decreases and the crystal quality as determined by X-ray diffraction measurements improves, while the cross-polarizer image contrast becomes more pronounced. The observed trends are discussed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1804 / 1809
页数:6
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