Local surface charge dissipation studied using force spectroscopy method of atomic force microscopy

被引:3
|
作者
Revilla, Reynier I. [1 ]
Yang, Yan-Lian [1 ]
Wang, Chen [1 ]
机构
[1] Chinese Acad Sci, Natl Ctr Nanosci & Technol, Key Lab Standardizat & Measurement Nanotechnol, Beijing 100190, Peoples R China
基金
中国国家自然科学基金;
关键词
surface charge; charge dissipation; force spectroscopy; atomic force microscopy (AFM); RESOLUTION; SILICON; WATER; MICA; NANOCRYSTALS; TRANSPORT;
D O I
10.1002/sia.5761
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We propose herein a method to study local surface charge dissipation in dielectric films using force spectroscopy technique of atomic force microscopy. By using a normalization procedure and considering an analytical expression of the tip-sample interaction force, we could estimate the characteristic time decay of the dissipation process. This approach is completely independent of the atomic force microscopy tip geometry and considerably reduces the amount of experimental data needed for the calculation compared with other techniques. The feasibility of the method was demonstrated in a freshly cleaved mica surface, in which the local charge dissipation after cleavage followed approximately a first-order exponential law with the characteristic time decay of approximately 7-8min at 30% relative humidity (RH) and 2-3.5min at 48% RH. Copyright (c) 2015 John Wiley & Sons, Ltd.
引用
收藏
页码:657 / 662
页数:6
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