Gradient titanium-carbon layers grown by pulsed laser deposition combined with magnetron sputtering

Gradient titanium-carbon films were grown by a combination of laser ablation and magnetron sputtering. A laser was used for the deposition of carbon films. Simultaneously, titanium was magnetron sputtered onto the same substrate. Layers were created for various deposition regimes (magnetron power, time sharing, ambient). The geometrical configuration used and growth regimes and thickness profile distribution are presented. The quantitative compositional depth profile of carbon and nitrogen species was also studied.