Thermoreflectance Imaging Measurement of In-plane Thermal Properties of Thin-film Structures

被引：1
|
作者：
Wang, Xi [1 ]
Shakouri, Ali [1 ]
Mavrokefalos, Anastassios [2 ]
Lee, Yong [2 ]
Kong, Huijun [2 ]
Shi, Li [2 ]
机构：
[1] Univ Calif Santa Cruz, Dept Elect Engn, 1156 High St, Santa Cruz, CA 95064 USA
[2] Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
来源：
26TH ANNUAL IEEE SEMICONDUCTOR THERMAL MEASUREMENT AND MANAGEMENT SYMPOSIUM, PROCEEDINGS 2010 | 2010年
关键词：
Thin film; In-plane thermal conductivity; thermoreflectance; 3-OMEGA METHOD; CONDUCTIVITY;
D O I：
10.1109/STHERM.2010.5444284
中图分类号：
O414.1 [热力学];
学科分类号：
摘要：
The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film in-plane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.
引用
收藏
页码：235 / 239
页数：5
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