Long wavelength photoluminescence emission from InAs quantum dots embedded in GaAs matrix

被引:0
|
作者
Saravanan, S [1 ]
Shimizu, H [1 ]
机构
[1] ATR Wave Engn Labs, Dept Nonlinear Sci, 2-2-2 Hikaridai, Keihanna Sci City, Kyoto 6190288, Japan
关键词
molecular beam epitaxy; atomic force microscopy; semiconducting III-V materials; InAs quantum dots; photoluminescence; FWHM;
D O I
10.1117/12.637589
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Light emission with a wavelength of 1272 nm at room temperature (RT) from self-assembled InAs quantum dots embedded in the GaAs matrix has been obtrained. Growth interruption during the formation of InAs quantum dots (QDs) on a GaAs (100) substrate has been investigated in detail. 1.9 mono layers (MLs) of an InAs QD nucleation layer was grown continuously to form a "seed" with high density. Further, the supply of up to 3 MLs of InAs with a growth interruption of 15 s for every 0.11 ML showed that photoluminescence intensity was improved by 23 times and red-shifted the photoluminescence emission nearly 42 nm. The continuous growth up to 1.9 MLs helped to double the dot density. 3.3 MLs of InAs embedded in a GaAs matrix, grown using interruption showed a strong RT photoluminescence peak at around 1272 nm with a very narrow FWHM of 27.1 meV.
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页数:6
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