AIR-BRIDGE CONTACT FABRICATION FOR IN-PLANE ACTIVE PHOTONIC CRYSTAL DEVICES

被引：0
|
作者：
Kaspar, P. [1 ]
Kappeler, R. [1 ]
Friedli, P. [1 ]
Jaeckel, H. [1 ]
机构：
[1] ETH, Elect Lab IfE, Commun Photon Grp, CH-8092 Zurich, Switzerland
来源：
2010 22ND INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS (IPRM) | 2010年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The fabrication of air-bridge contacts for in-plane active photonic crystal devices is presented. The technology allows to access waveguides as narrow as 200nm. The main fabrication challenges described in detail are surface planarization and formation of isolation layers for contact pads. The issue of surface damage effects on dry-etched sidewalls is addressed and current measurements on narrow contacts were performed.
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页数：4
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