Surface evolution of elastically stressed films under deposition by a diffuse interface model

被引：98

作者：

Rätz, A ^{[1
]}

Ribalta, A ^{[1
]}

Voigt, A ^{[1
]}

机构：

[1] Res Ctr Caesar, Crystal Growth Grp, D-53175 Bonn, Germany

来源：

JOURNAL OF COMPUTATIONAL PHYSICS | 2006年 / 214卷 / 01期

关键词：

surface evolution; diffuse interface models; anisotropy; adaptive finite elements;

D O I：

10.1016/j.jcp.2005.09.013

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

We consider the heteroepitaxial growth of thin films by numerical simulations within a diffuse interface model. The model is applicable to describe the self-organization of nanostructures. The influence of strain, surface energies and kinetics on the surface evolution is considered. A matched asymptotic analysis shows the formal convergence of an anisotropic viscous Cahn-Hilliard model to a general surface evolution equation. The system is solved by adaptive finite elements in three dimensions and in special cases compared with sharp interface models. (c) 2005 Elsevier Inc. All rights reserved.

引用

页码：187 / 208

页数：22

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