Plasmonic arrays of titanium nitride nanoparticles fabricated from epitaxial thin films

被引:44
|
作者
Murai, Shunsuke [1 ]
Fujita, Koji [1 ]
Daido, Yohei [1 ]
Yasuhara, Ryuichiro [1 ]
Kamakura, Ryosuke [1 ]
Tanaka, Katsuhisa [1 ]
机构
[1] Kyoto Univ, Grad Sch Engn, Dept Chem Mat, Nishikyo Ku, Kyoto 6158510, Japan
来源
OPTICS EXPRESS | 2016年 / 24卷 / 02期
关键词
INDIUM TIN OXIDE; LASER DEPOSITION; GROWTH; SILVER; RESONANCES; GRATINGS; LIGHT;
D O I
10.1364/OE.24.001143
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have fabricated two-dimensional periodic arrays of titanium nitride (TiN) nanoparticles from epitaxial thin films. The thin films of TiN, deposited on sapphire and single crystalline magnesium oxide substrates by a pulsed laser deposition, are metallic and show reasonably small optical loss in the visible and near infrared regions. The thin films prepared were structured to the arrays of nanoparticles with the pitch of 400 nm by the combination of nanoimprint lithography and reactive ion etching. Optical transmission indicates that the arrays support the collective plasmonic modes, where the localized surface plasmon polaritons in TiN nanoparticles are radiatively coupled through diffraction. Numerical simulation visualizes the intense fields accumulated both in the nanoparticles and in between the particles, confirming that the collective mode originates from the simultaneous excitation of localized surface plasmon polaritons and diffraction. This study experimentally verified that the processing of TiN thin films with the nanoimprint lithography and reactive ion etching is a powerful and versatile way of preparing plasmonic nanostructures. (C) 2016 Optical Society of America
引用
收藏
页码:1143 / 1153
页数:11
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