A Perspective on Collaborative Research for Emerging Technologies and Design

A perspective is given using student projects on how university research can be an important resource for the highly advanced and sophisticated photomask industry. The collaborative and cross-discipline nature of innovation in the IC industry naturally leads to win-win relationships. Specific examples are given of successful collaborative research projects from the University of California consortium "Integrated Modeling Process and Computation for Technology" ( IMPACT). The examples include research on lithography and inspection, devices, statistical characterization, and Design-for-Manufacturing frameworks for multiple-patterning and EUV. The paper concludes with a perspective on future opportunities, challenges and plans. The technical details of the student projects were published but not presented in connection with Photomask Japan 2011 (SPIE Proc. 8081).