Electron dynamics of silicon surface states: Second-harmonic hole burning on Si(111)-(7x7)

被引:5
|
作者
McGuire, JA [1 ]
Raschke, MB
Shen, YR
机构
[1] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
[2] Lawrence Berkeley Natl Lab, Div Sci Mat, Berkeley, CA 94720 USA
[3] Max Born Inst Nichtlineare Opt & Kurzzeitspektros, D-12489 Berlin, Germany
关键词
D O I
10.1103/PhysRevLett.96.087401
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report the first all-optical study of homogeneous linewidths of surface excitations by the spectral-hole-burning technique with surface-specific second-harmonic generation as a probe. Measurement of transient spectral holes induced by a 100 fs pump pulse in excitations of the surface dangling-bond states of Si(111)-(7x7) led to a pump-fluence-dependent homogeneous linewidth as broad as similar to 100 meV or a dephasing time as short as 15 fs. The hole-burning spectra also revealed a strong coupling between the localized dangling-bond states and the associated surface phonon mode at 570 cm(-1). Carrier-carrier scattering was responsible for the linear dependence of the dephasing rate on pump fluence, and the carrier screening effect appeared to be weak.
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页码:1 / 4
页数:4
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