Electron field emission from nitrogenated tetrahedral amorphous carbon investigated by current imaging tunneling spectroscopy

被引：6
|
作者：
Cheah, LK [1 ]
Shi, X [1 ]
Liu, E [1 ]
机构：
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Ion Beam Proc Lab, Singapore 639798, Singapore
来源：
APPLIED SURFACE SCIENCE | 1999年 / 143卷 / 1-4期
关键词：
nitrogenated tetrahedral amorphous carbon; filtered cathodic vacuum arc; field emission; current imaging tunneling microscopy; scanning tunneling microscopy;
D O I：
10.1016/S0169-4332(99)00078-1
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Electron field emission from nitrogenated tetrahedral amorphous carbon (ta-C:N) films with and without H ion surface post-treatment is investigated by current imaging tunneling spectroscopy (CITS). The post-treated ta-C:N film shows a lower threshold electric field, a higher emission current, and denser emission spots. The scanning tunneling microscopic (STM) images show more distinctive nanoclusters for the post-treated films compared to the untreated films. Scanning tunneling spectroscopy (STS) shows that a lower threshold electric field and a higher emission current density have been obtained from these clusters. Therefore, we believe that the electrons predominantly emit from the sp(3) rich clusters during field emission. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：309 / 312
页数：4
相关论文
共 50 条
  • [1] Electron field emission from nitrogenated tetrahedral amorphous carbon investigated by current imaging tunneling spectroscopy
    Ion Beam Processing Laboratory, Block S1, Sch. Elec. Electron. E., Singapore, Singapore
    [J]. Appl Surf Sci, 1 (309-312):
  • [2] Field electron emission characteristics of nitrogenated tetrahedral amorphous carbon films
    Zhang, XW
    Cheung, WY
    Wong, SP
    [J]. THIN SOLID FILMS, 2003, 429 (1-2) : 261 - 266
  • [3] Electron field emission from multilayered tetrahedral amorphous carbon films
    Shi, X
    Cheah, LK
    Silva, SRP
    Tay, BK
    Yang, HS
    Sun, Z
    [J]. COVALENTLY BONDED DISORDERED THIN-FILM MATERIALS, 1998, 498 : 215 - 220
  • [4] Field emission from tetrahedral amorphous carbon
    Satyanarayana, BS
    Hart, A
    Milne, WI
    Robertson, J
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (10) : 1430 - 1432
  • [5] Field emission from tetrahedral amorphous carbon
    Satyanarayana, BS
    Hart, A
    Milne, WI
    Robertson, J
    [J]. DIAMOND AND RELATED MATERIALS, 1998, 7 (2-5) : 656 - 659
  • [6] Field emission of nitrogenated amorphous carbon films
    Hoffmann, U
    Weber, A
    Klages, CP
    Matthée, T
    [J]. CARBON, 1999, 37 (05) : 753 - 757
  • [7] Electron field emission from surface treated tetrahedral amorphous carbon films
    Shi, X
    Cheah, LK
    Tay, BK
    Silva, SRP
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (06) : 833 - 835
  • [8] Electron field emission from tetrahedral amorphous carbon films with multilayer structure
    Zhao, JP
    Chen, ZY
    Wang, X
    Shi, TS
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (11) : 8098 - 8102
  • [9] Electron field emission properties of tetrahedral amorphous carbon films
    Cheah, LK
    Shi, X
    Liu, E
    Tay, BK
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (09) : 6816 - 6821
  • [10] Thickness-independent electron field emission from tetrahedral amorphous carbon films
    Zhao, JP
    Chen, ZY
    Wang, X
    Shi, TS
    Yano, T
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (02) : 191 - 193
12345