Deposition of highly oriented ZnS thin films on Si(100) substrate using electrostatic spray assisted vapor deposition

被引：0
|
作者：
Wei, M [1 ]
Choy, KL [1 ]
机构：
[1] Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
来源：
CHEMICAL VAPOR DEPOSITION | 2002年 / 8卷 / 01期
关键词：
D O I：
10.1002/1521-3862(20020116)8:1<15::AID-CVDE15>3.0.CO;2-F
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Highly oriented ZnS thin films have been deposited on Si (100) using a mixture of zinc chloride and thiourea as precursors and a simple and effective electrostatic spray assisted vapor deposition method. XRD analysis indicated that deposited films are highly 100 oriented in contrast to ZnS films deposited on glass substrates, which are known to have a preferred (111) orientation. HRTEM analysis showed the presence of an amorphous interface layer and high degree of orientation, which is attributed to the interaction of the charged precursor with the single crystal substrate under the high electric field.
引用
收藏
页码：15 / +
页数：4
相关论文
共 50 条
  • [1] Deposition of highly oriented ZnS thin films on Si(100) substrate using electrostatic spray assisted vapor deposition
    Wei, Ming
    Choy, Kwang-L.
    2002, Wiley-VCH Verlag (14)
  • [2] Microstructure of textured ZnS thin films produced by electrostatic spray assisted vapour deposition
    Wei, M
    Choy, KL
    MICROSCOPY OF SEMICONDUCTING MATERIALS 2001, 2001, (169): : 225 - 228
  • [3] Deposition of Y2O3 thin films by electrostatic spray assisted vapor deposition method
    Wang, Yao-Hua
    Lü, Fan-Xiu
    He, Qi
    Li, Cheng-Ming
    Tang, Wei-Zhong
    Beijing Keji Daxue Xuebao/Journal of University of Science and Technology Beijing, 2009, 31 (08): : 1028 - 1032
  • [4] Spray pyrolysis deposition and characterization of highly (100) oriented magnesium oxide thin films
    Raj, A. Moses Ezhil
    Nehru, L. C.
    Jayachandran, M.
    Sanjeeviraja, C.
    CRYSTAL RESEARCH AND TECHNOLOGY, 2007, 42 (09) : 867 - 875
  • [5] Direct deposition of single-walled carbon nanotube thin films via electrostatic spray assisted chemical vapor deposition
    Hsieh, Ya-Ping
    Hofmann, Mario
    Son, Hyungbin
    Jia, Xiaoting
    Chen, Yang-Fang
    Liang, Chi-Te
    Dresselhaus, Mildred S.
    Kong, Jing
    NANOTECHNOLOGY, 2009, 20 (06)
  • [6] Titanium dioxide anatase thin films produced by electrostatic spray assisted vapor deposition (ESAVD) technique
    Choy, KL
    Su, B
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1999, 18 (12) : 943 - 945
  • [7] Electrostatic assisted aerosol jet deposition of CdS, CdSe and ZnS thin films
    Su, B
    Choy, KL
    THIN SOLID FILMS, 2000, 361 : 102 - 106
  • [8] Highly-oriented AlN thin films on Si(100) substrates by pulsed laser deposition
    Zhang, X
    Chen, TL
    Li, XM
    JOURNAL OF INORGANIC MATERIALS, 2005, 20 (02) : 419 - 424
  • [9] Synthesis of mesostructured thin films by ionic wind assisted electrostatic spray deposition
    Khodadadi, S.
    Meesters, G. M. H.
    Biskos, G.
    PARTICUOLOGY, 2016, 27 : 128 - 132
  • [10] Growth behavior and microstructure of CdS thin films deposited by an electrostatic spray assisted vapor deposition (ESAVD) process
    Choy, KL
    Su, B
    THIN SOLID FILMS, 2001, 388 (1-2) : 9 - 14
12345