High-Temperature Annealing of Sputter-Deposited AlN on Diamond Substrate

被引：0
|
作者：
Shirato, Tatsuya [1 ]
Hayashi, Yusuke [2 ]
Uesugi, Kenjiro [3 ]
Shojiki, Kanako [2 ]
Miyake, Hideto [1 ,2 ]
机构：
[1] Mie Univ, Grad Sch Engn, Tsu, Mie, Japan
[2] Mie Univ, Grad Sch RIS, Tsu, Mie, Japan
[3] Mie Univ, SPORR, Tsu, Mie, Japan
来源：
2019 COMPOUND SEMICONDUCTOR WEEK (CSW) | 2019年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页数：1
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