Characterization of PECVD films of SiOxNy:H

被引：0
|
作者：
Viard, J
Durand, J
Bèche, E
Berjoan, R
Ducarroir, M
Nadal, M
机构：
[1] CNRS, UMR 5635, Lab Mat & Proc Membranaires, F-34296 Montpellier 5, France
[2] CNRS, UPR 8521, Inst Sci & Genie Mat & Proc, F-66120 Font Romeu, France
[3] CNRS, UPR 8521, Inst Sci & Genie Mat & Proc, F-66860 Perpignan, France
来源：
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 1999年 / 54卷 / 294期
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：503 / 512
页数：10
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