Molecular beam epitaxial growth of InAs quantum dots on GaAs for high characteristics temperature lasers

被引:2
|
作者
Yuan Ye [1 ,2 ]
Su Xiang-Bin [1 ,2 ]
Yang Cheng-ao [1 ,2 ]
Zhang Yi [1 ,2 ]
Shang Jin-Ming [1 ,2 ]
Xie Sheng-Wen [1 ,2 ]
Zhang Yu [1 ,2 ]
Ni Hai-Qiao [1 ,2 ]
Xu Ying-Qiang [1 ,2 ]
Nil Zhi-Chuan [1 ,2 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optmlectron Engn, Beijing 100049, Peoples R China
[3] Beijing Acad Quantum Informat Sci, Beijing 100193, Peoples R China
[4] Shanxi Univ, Coll Phys & Elect Engn, Lab Solid Quantum Mat Ctr, Taiyuan 030006, Peoples R China
基金
中国国家自然科学基金;
关键词
quantum dot laser; molecular beam epitaxy; characteristics temperature; mid-infrared; MODULATION CHARACTERISTICS; PERFORMANCE; DEPENDENCE;
D O I
10.11972/j.issn.1001-9014.2020.06.001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
GaAs-based 1. 3 mu m InAs quantum dot laser have been grown by MBE system. Under the optimized InAs quantum dots growth temperature of 520.,and the methods of Be-doping in the active region are adopted for better device performance. With a ridge width of 100 mu m and cavity length of 2 mm,the maximum output power of single facet without coating has reached up to 1008 mW under continuous wave(CW)operation at room temperature,and the threshold current density is 110 A/cm(2). The QD lasers can still operate at continuous waves (CW)up to 80 degrees C,and the characteristic temperature below 50 degrees C is as high as 405 K.
引用
收藏
页码:667 / 670
页数:4
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