Cold Cathode Sputtering in Glow Discharges

被引:1
|
作者
Alberts, Ian L. [1 ]
Barratt, David S. [2 ]
Ray, Asim K. [1 ]
机构
[1] Brunel Univ, Wolfson Ctr Mat Proc, Uxbridge UB8 3PH, Middx, England
[2] VEKA Plc, Burnley BB11 5DA, Lancs, England
来源
JOURNAL OF DISPLAY TECHNOLOGY | 2012年 / 8卷 / 08期
关键词
Glow discharge; sputtering; cathode erosion; CCFL; cold cathode; hollow cathode effect; FLUORESCENT LAMPS; THERMALIZATION; DIFFUSION; ATOMS;
D O I
10.1109/JDT.2012.2198194
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A constant challenge for industrialists in cold cathode technologies is the selection of a cathode material which exhibits suitable properties in order to improve performance. One particularly important aspect of performance is the sputter erosion of the cathode, which can lead to lamp failures. Traditionally, refractory metals have been favored for their high densities and energies of sublimation, which result in low sputter yields according to the theory due to Sigmund, and in experiment. However, this paper presents a simple theory which shows that the primary sputter yield is only one step in the liberation of sputtered material from the electrode. The energy of sublimation in fact plays an important role in the energy distribution of the sputtered material. Also, collisions in the bulk gas and the voltage characteristics of the cathode dark space should be taken into consideration for calculating the flux of liberated material. The paper presents a heuristic model of cold cathode sputtering in glow discharges with a view to elucidating the underlying physics in the process. The theory results in a reappraisal of electrode material properties that differs from the traditional view.
引用
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页码:450 / 456
页数:7
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