Fractal characteristics of TiO2-Ag nanocomposite films deposited by a grid-assisted co-sputtering method

被引:18
|
作者
Meymian, Mohammad Reza Zamani [1 ]
Abdolvahab, Rouhollah Haji [1 ]
Mehr, Ali Kosari [1 ]
机构
[1] Iran Univ Sci & Technol, Phys Dept, Tehran 1684613114, Iran
关键词
Permutation entropy; Roughness; Grid-assisted co-sputtering; Multifractal analysis; Ultraviolet-visible spectroscopy; Photoluminescence spectroscopy; THIN-FILMS; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOCATALYTIC ACTIVITY; OPTICAL-PROPERTIES; AG; POWER; AU;
D O I
10.1016/j.apsusc.2019.03.026
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
TiO2-Ag composite films are deposited on glass substrates by a novel grid-assisted co-sputtering method, aiming at preparing films with different silver contents. The films are characterized by energy-dispersive X-ray spectroscopy, field emission scanning electron microscopy, atomic force microscopy (AFM), ultraviolet-visible spectroscopy, and photoluminescence spectroscopy. Furthermore, the parameters of saturation roughness, fractal spectra, and permutation entropy are utilized to analyze the AFM images; the permutation entropy is employed in a 2D matrix to measure the complexity. The atomic ratios of silver to titanium range from 0.09 to 7.80, and the observed optical band gaps are in the range of 3.17 to 3.26 eV. Photoluminescence spectroscopy reveals the photoinduced-electron-trapping effect of Ag particles in the structure and surface of the films governs the emission intensities. The AFM images show the roughness of the films increases by increasing the Ag content, and it can be seen that an increase in the TiO2 content of the films results in an increase in fluctuation per area, hence increasing the permutation entropy. Therefore, it is proposed that the Ag content of the films could be predicted by surface roughness and permutation entropy measurements; the fractality of the data allows a more precise determination of silver content.
引用
收藏
页码:593 / 600
页数:8
相关论文
共 50 条
  • [1] Grid-Assisted Co-Sputtering Method: Background, Advancement, and Prospect
    Kosari Mehr, Ali
    Kosari Mehr, Abbas
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2021, 41 (03) : 713 - 744
  • [2] Grid-Assisted Co-Sputtering Method: Background, Advancement, and Prospect
    Ali Kosari Mehr
    Abbas Kosari Mehr
    Plasma Chemistry and Plasma Processing, 2021, 41 : 713 - 744
  • [3] Preparation of Pt/TiO2 nanocomposite films using co-sputtering method
    Sasaki, T
    Koshizaki, N
    Terauchi, S
    Umehara, H
    Matsumoto, Y
    Koinuma, M
    NANOSTRUCTURED MATERIALS, 1997, 8 (08): : 1077 - 1083
  • [4] Characteristics of IZSO films deposited by a co-sputtering system
    Jung Rak Lee
    Do Geun Kim
    Gun Hwan Lee
    Yong Ho Park
    Pung Keun Song
    Metals and Materials International, 2007, 13 : 399 - 402
  • [5] Characteristics of IZSO films deposited by a co-sputtering system
    Lee, Jung Rak
    Kim, Do Geun
    Lee, Gun Hwan
    Park, Yong Ho
    Song, Pung Keun
    METALS AND MATERIALS INTERNATIONAL, 2007, 13 (05) : 399 - 402
  • [6] Characteristics of TiO2 and Ag/TiO2 optical thin film by Co-sputtering method
    Kim, Sang Cheol
    Hahn, Sung Hong
    Kim, Eui Jung
    Lee, Chung Woo
    Joo, Jong Hyun
    Kim, Goo Cheol
    KOREAN JOURNAL OF OPTICS AND PHOTONICS, 2005, 16 (02) : 168 - 173
  • [7] Preparation of M/TiO2 (M = Au, Pt) nanocomposite films using co-sputtering method
    Sasaki, T
    Koshizaki, N
    Koinuma, M
    Matsumoto, Y
    NANOSTRUCTURED MATERIALS, 1999, 12 (1-4): : 511 - 514
  • [8] Preparation of M/TiO2 (M = Au, Pt) nanocomposite films using co-sputtering method
    Sasaki, Takeshi
    Koshizaki, Naoto
    Koinuma, Michio
    Matsumoto, Yasumichi
    Nanostructured Materials, 1999, 12 (01): : 511 - 514
  • [9] Characteristics of zirconium based amorphous thin films deposited by Co-sputtering
    Jeon, Chang-Bae
    Kong, Seong-Ho
    Shin, Hyunjung
    Ahn, Jinho
    Kim, Jiyoung
    Integrated Ferroelectrics, 2002, 48 : 33 - 40
  • [10] Characteristics of zirconium based amorphous thin films deposited by co-sputtering
    Jeon, CB
    Kong, SH
    Shin, H
    Ahn, J
    Kim, J
    INTEGRATED FERROELECTRICS, 2002, 48 : 33 - 40