Performance evaluation of serial photolithography clusters: Queueing models, throughput and workload sequencing

被引：0

作者：

Morrison, James R. ^{[1
]}

Bortnick, Beverly ^{[2
]}

Martin, Donald P. ^{[3
]}

机构：

[1] Cent Michigan Univ, Engn & Technol Dept, Mt Pleasant, MI 48859 USA

[2] IBM Corp, Integrated Supply Chain, Essex Jct, VT USA

[3] IBM Corp, Prod Characterizat, Essex Jct, VT USA

来源：

2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP | 2006年

关键词：

cluster tools; queueing models; photolithography performance evaluation; throughput; cycle time; workload sequencing;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

For clustered configuration of a photolithography toolset, operating under a scheduling policy inducing serial processing, measures of system performance are deduced. Queueing models demonstrate that, due to the parallelism inherent in the system configuration, the normalized cycle time behavior is different than that of the standard single server queue. Cluster throughput is evaluated based on measures of the frequency and magnitude of events common in manufacturing operation. It is shown that the maxi. mum throughput of a serial photolithography cluster tool is not influenced by the order in which two classes of lots with different wafer processing speeds are processed.

引用

页码：44 / +

页数：3

共 20 条

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