Effect of Mo Vacancy on the Photoresponse of Bilayer MoS2 Film

被引:0
|
作者
Kim, Ju Won [1 ,2 ]
Kim, Sang-il [3 ]
Kim, TaeWan [1 ,2 ]
机构
[1] Jeonbuk Natl Univ, Dept Elect Engn, Jeonju 54896, South Korea
[2] Jeonbuk Natl Univ, Smart Grid Res Ctr, Jeonju 54896, South Korea
[3] Univ Seoul, Dept Mat Sci & Engn, Seoul 02504, South Korea
来源
基金
新加坡国家研究基金会;
关键词
MoS2; Phototransistor; Photoresponsivity; Mo vacancy; 2D Transition metal dichalcogenides; MONOLAYER MOS2; OPTICAL-PROPERTIES; LAYER MOS2; PHOTODETECTORS;
D O I
10.5757/ASCT.2022.31.5.107
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photodetectors that can detect light over a broad spectral range have attracted significant attention. Recently, molybdenum disulfide (MoS2), a known transition metal dichalcogenide, is considered a good photodetector material. In this study, MoS2 film was prepared by metal-organic chemical vapor deposition (MOCVD) on an SiO2/Si substrate. The effect of Mo vacancies on the structural, electrical, and optical properties of MoS2 films was analyzed. Results show that the synthesized MoS2-based phototransistor exhibits a photoresponsivity as high as 125 A/W at 0.02 mW power density of the 850 nm laser at room temperature (300 K). The Mo vacancies were confirmed in the MoS2 bilayer through XPS measurements. MOCVD-grown bilayer MoS2-based phototransistors with Mo vacancies allowed the detection of a wider wavelength range of 400-1150 nm. Thus, introducing Mo vacancies improved the optoelectronic properties of MoS2 phototransistors.
引用
收藏
页码:107 / 109
页数:3
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