UV capillary force lithography for multiscale structures

被引：10
|
作者：
Hansen, M. [1 ]
Ziegler, M. [1 ]
Kohlstedt, H. [1 ]
Pradana, A. [1 ]
Raedler, M. [1 ]
Gerken, M. [1 ]
机构：
[1] Univ Kiel, Tech Fak Kiel, D-24143 Kiel, Germany
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2012年 / 30卷 / 03期
关键词：
NANOIMPRINT LITHOGRAPHY; IMPRINT;
D O I：
10.1116/1.3696696
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Rapid advances in information technology rely on novel patterning techniques. The authors present a simple UV capillary force lithography process, which allows one to imprint a multiscale system, consisting of 250 nm wide nanobridges and a 8-20 mu m wide wiring in one lithography step. An additional annealing step for 5 min at 75 degrees C improved the capillary rise. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.3696696]
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页数：4
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