Subwavelength interference lithography based on a unidirectional surface plasmon coupler

被引：7
|
作者：
Yang, Xuefeng [1 ]
Zhang, Shuxia [1 ]
Zhang, Dao Hua [2 ]
Wang, Yueke [3 ]
Wang, Jian [1 ]
机构：
[1] Henan Polytech Univ, Sch Phys & Chem, Jiaozuo 454000, Peoples R China
[2] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[3] Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China
来源：
OPTICAL ENGINEERING | 2013年 / 52卷 / 08期
基金：
中国国家自然科学基金;
关键词：
lithography; interference; optical limiting;
D O I：
10.1117/1.OE.52.8.086109
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A subwavelength interference lithography method is numerically demonstrated based on surface plasmon polaritons excited by unidirectional couplers, and the unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated from one side of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch pattern can be obtained at the working wavelength of 365 nm, and this method can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous to the fabrication process in practical applications. (C) 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
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页数：3
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