Characterization of Dislocation-Based Nanotransistors

Dislocations are native nanowires. The realization of well-defined dislocation networks allows the electrical characterization of only a small number of dislocations. Different types of dislocations were analyzed by integration into the channel of MOSFETs. A substantial increase of the drain current was proved if only a few dislocations are present in the channel of nMOSFETs. Low-temperature measurements indicate single-electron tunneling on dislocation core defects.