Thickness-dependent elastic strain in Stranski-Krastanow growth

被引:11
|
作者
Dirko, Vladimir V. [1 ,2 ]
Lozovoy, Kirill A. [1 ,2 ]
Kokhanenko, Andrey P. [1 ,2 ]
Voitsekhovskii, Alexander V. [2 ]
机构
[1] Natl Res Tomsk State Univ, Fac Radiophys, Lab Quantum Informat Technol, 36 Lenin Av, Tomsk 634050, Russia
[2] Natl Res Tomsk State Univ, Fac Radiophys, Lab Nanoelect & Nanaphoton, 36 Lenin Av, Tomsk 634050, Russia
关键词
QUANTUM DOTS; GE DEPOSITION; SURFACE; RELAXATION; NANOSTRUCTURES; SI(111); DRIVEN; ENERGY; RHEED; 2D;
D O I
10.1039/d0cp03538f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, we comprehensively consider the effect of the dependence of elastic strain on the thickness of deposited material on the formation of two-dimensional layers and quantum dots by the Stranski-Krastanow mechanism. The nucleation and growth of germanium quantum dots on silicon surface (100) are used as a model system for conducting experimental studies and theoretical calculations. A detailed dependence of the value of elastic strains on the effective thickness of deposited germanium is obtained. It is also shown that the magnitude of the 1/Nsuperstructural periodicity in this system reaches 12.5%. Based on the obtained thickness dependence of lattice mismatch, a new theory is constructed for calculating the parameters of the formed islands, generalizing previously used thermodynamic models. The equilibrium and critical thicknesses of the wetting layer are determined for the first time under the assumption that lattice mismatch depends on the thickness of the deposited material. In this approximation, some unexpected results are obtained that refine traditional thermodynamic models and confirmed by experimental data. The results of this work and proposed theoretical model may be applied for strain engineering in other material systems where growth of two-dimensional materials and quantum-sized islands by the Stranski-Krastanow mechanism is realized.
引用
收藏
页码:19318 / 19325
页数:8
相关论文
共 50 条
  • [1] Critical layer thickness in Stranski-Krastanow growth of Ge on Si(001)
    Varga, K
    Wang, LG
    Pantelides, ST
    Zhang, ZY
    SURFACE SCIENCE, 2004, 562 (1-3) : L225 - L230
  • [2] Stranski-Krastanow growth of germanium on silicon nanowires
    Pan, L
    Lew, KK
    Redwing, JM
    Dickey, EC
    NANO LETTERS, 2005, 5 (06) : 1081 - 1085
  • [3] Epitaxial island growth and the Stranski-Krastanow transition
    Cullis, AG
    Norris, DJ
    Walther, T
    Migliorato, MA
    Hopkinson, M
    CURRENT ISSUES IN HETEROEPITAXIAL GROWTH-STRESS RELAXATION AND SELF ASSEMBLY, 2002, 696 : 3 - 10
  • [4] Elastic energy release rate of quantum islands in Stranski-Krastanow growth
    Yang, B
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (07) : 3704 - 3710
  • [5] Stranski-Krastanow transition and epitaxial island growth
    Cullis, AG
    Norris, DJ
    Walther, T
    Migliorato, MA
    Hopkinson, M
    PHYSICAL REVIEW B, 2002, 66 (08): : 1 - 4
  • [6] Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth
    Jesson, DE
    Munt, TP
    Lou, CG
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (10): : 7230 - 7231
  • [7] Mass transfer in Stranski-Krastanow growth of InAs on GaAs
    Ramachandran, TR
    Heitz, R
    Chen, P
    Madhukar, A
    APPLIED PHYSICS LETTERS, 1997, 70 (05) : 640 - 642
  • [8] Critical thickness for nanostructure self-assembly during Stranski-Krastanow growth
    Jesson, D.E., 1600, Japan Society of Applied Physics (43):
  • [9] Investigations on the Stranski-Krastanow growth of CdSe quantum dots
    Schikora, D
    Schwedhelm, S
    As, DJ
    Lischka, K
    Litvinov, D
    Rosenauer, A
    Gerthsen, D
    Strassburg, M
    Hoffmann, A
    Bimberg, D
    APPLIED PHYSICS LETTERS, 2000, 76 (04) : 418 - 420
  • [10] Nature of Stranski-Krastanow growth of InAs on GaAs(001)
    Ramachandran, TR
    Madhukar, A
    Mukhametzhanov, I
    Heitz, R
    Kalburge, A
    Xie, Q
    Chen, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (03): : 1330 - 1333