Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Part 1: Effective relative permittivity

被引:3
|
作者
Hartmanova, Maria [1 ]
Nadazdy, Vojtech [1 ]
Kundracik, Frantisek [2 ]
Mansilla, Catina [3 ]
机构
[1] Slovak Acad Sci, Inst Phys, Bratislava 84511, Slovakia
[2] Comenius Univ, Dept Expt Phys, Fac Math Phys & Informat, Bratislava 84248, Slovakia
[3] Univ Seville, CSIC, Inst Mat Sci, Seville 41092, Spain
关键词
CeO2 + x; Sm2O3 thin films; Relative permittivity; Impedance spectroscopy; Deep level transient spectroscopy; Electron beam-physical vapour deposition; Ionic beam assisted deposition; DIELECTRIC RELAXATIONS; IMPEDANCE SPECTROSCOPY; GATE DIELECTRICS; OXIDATION; CERIA; Y2O3;
D O I
10.1016/j.apsusc.2012.10.056
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Study is devoted to the effective relative permittivity epsilon(r) of CeO2 + x. Sm2O3 thin films prepared by electron-beam physical vapour deposition and ionic beam-assisted deposition methods; epsilon(r) was investigated by three independent ways from the bulk parallel capacitance C-p, impedance capacitance C-imp, and accumulation capacitance C-acc in dependence on the deposition conditions (deposition temperature, dopant amount x and Ar+ ion bombardment during the film deposition) used. Investigations were performed using impedance spectroscopy, capacitance-voltage and current-voltage characteristics as well as deep level transient spectroscopy. Results obtained are described and discussed. (C) 2012 Elsevier B. V. All rights reserved.
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页码:65 / 71
页数:7
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