Hot carrier effects in self-aligned and offset-gated polysilicon thin-film transistors

被引:0
|
作者
Arpatzanis, N. [1 ]
Hatzopoulos, A. T. [1 ]
Tassis, D. H. [1 ]
Dimitriadis, C. A. [1 ]
Kamarinos, G. [2 ]
机构
[1] Aristotle Univ Thessaloniki, Dept Phys, Thessaloniki 54124, Greece
[2] IMEP ENSERG, F-38016 Grenoble 1, France
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T [工业技术];
学科分类号
08 ;
摘要
The effects of hot carriers on the transfer characteristics of self-aligned and offset-gated polysilicon thin-film transistors (TFTs), with channel length L = 10 mu m and offset length Delta L = 2 mu m, are investigated. In the self-aligned device, the on-state current is substantially reduced, whereas the subthreshold slope remains almost unaffected. In the offset gated device, the transfer characteristic is shifted first positively and then negatively, the on-state current is still substantially reduced and well-defined kinks are formed in the subthreshold region. The device degradation is found to become more pronounced in the offset gated device. A model explaining the post-stress performance of the offset-gated device is presented.
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页码:353 / +
页数:2
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