The effect of line roughness on DUV scatterometry

被引：1
|
作者：
Henn, Mark-Alexander [1 ]
Heidenreich, Sebastian [1 ]
Gross, Hermann [1 ]
Bodermann, Bernd [1 ]
Baer, Markus [1 ]
机构：
[1] Phys Tech Bundesanstalt, Braunschweig, Germany
来源：
MODELING ASPECTS IN OPTICAL METROLOGY IV | 2013年 / 8789卷
关键词：
Scatterometry; Optical metrology; Line edge roughness; DIFFRACTION INTENSITIES;
D O I：
10.1117/12.2020761
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.
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页数：6
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