Compact model;
DG MOSFET;
Drain current;
Junctionless;
Long channel;
TRANSISTORS;
D O I:
10.1016/j.sse.2012.10.017
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
This paper presents a simple explicit compact model for the drain current of long channel symmetrical junctionless Double Gate MOSFETs. Our approach leads to very simple equations compared to other models, while retaining high accuracy and physical consistency. Explicit and analytical solutions are also given. Compared to TCAD simulations, the model gives excellent results in accumulation regime. Although the accuracy decreases in depletion regime for very high doping and semiconductor thicknesses, it still remains very good and it is shown that this issue can be neglected because if can only be seen on devices with both high doping and semiconductor thicknesses, that are unlikely to be used as a real device, because of their negative threshold voltage. Finally, it is shown that the model reproduces the two observed different conduction modes, related to accumulation and depletion regimes and that the effective gate capacitance and threshold voltage are different in those regimes, which explains the change of slope observed in the I-d(V-g) characteristics. (C) 2012 Elsevier Ltd. All rights reserved.
机构:
Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Lin, Xinnan
Zhang, Baili
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机构:
Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Zhang, Baili
Xiao, Ying
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机构:
Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Xiao, Ying
Lou, Haijun
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h-index: 0
机构:
Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Lou, Haijun
Zhang, Lining
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h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Zhang, Lining
Chan, Mansun
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h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China