Effects of NEA GaN photocathode performance parameters on quantum efficiency

被引:4
|
作者
Du, Yujie [1 ,2 ]
Chang, Benkang [1 ]
Fu, Xiaoqian [1 ]
Li, Biao [1 ]
Zhang, Junju [1 ]
机构
[1] NJUST, Inst Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Inst Bingzhou, Dept Phys, Bingzhou 256603, Shandong, Peoples R China
来源
OPTIK | 2012年 / 123卷 / 09期
基金
中国国家自然科学基金;
关键词
GaN; Negative electron affinity; Photoemission; Quantum yield; NEGATIVE ELECTRON-AFFINITY;
D O I
10.1016/j.ijleo.2011.05.035
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Using research on the negative electron affinity GaN photocathode photoemission mechanism, we obtained the reflective-type and transmission-type GaN photocathode quantum efficiency formulas. The influence on quantum efficiency and sensitivity of integral of cathode performance parameters such as electron surface escape probability P. electron diffusion length L-D, absorption coefficient alpha, back-interface recombination rate S-t and cathode thickness T-e, were analyzed using these formulas. It was found that to obtain negative electron affinity GaN optoelectronic cathodes with high quantum efficiencies, we must constantly improve cathode activation technologies and the surface escaping probability of cathode. Also, we must increase the electronic diffusion length, reduce the rate of compounding, and find the optimal thickness of the cathode transmit layer based for the specific electronic diffusion length. (C) 2011 Elsevier GmbH. All rights reserved.
引用
收藏
页码:800 / 803
页数:4
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