The Influence of Imperfections and Absorption on the Performance of a GaAs/AlOx High-Contrast Grating for Monolithic Integration With 980 nm GaAs-Based VCSELs

被引：9
|
作者：
Gebski, Marcin [1 ]
Dems, Maciej [1 ]
Chen, Jian [2 ]
Wang, Qi Jie [2 ,3 ]
Zhang, Dao Hua [2 ]
Czyszanowski, Tomasz [1 ]
机构：
[1] Lodz Univ Technol, Inst Phys, Photon Grp, PL-90924 Lodz, Poland
[2] Nanyang Technol Univ, OPTIMUS, Photon Ctr Excellence, Sch Elect & Elect Engn, Singapore 639798, Singapore
[3] Nanyang Technol Univ, Sch Phys & Math Sci, Ctr Disrupt Photon Technol, Singapore 637371, Singapore
来源：
JOURNAL OF LIGHTWAVE TECHNOLOGY | 2013年 / 31卷 / 23期
关键词：
High contrast gratings; numerical simulations; vertical-cavity surface-emitting lasers (VCSEL);
D O I：
10.1109/JLT.2013.2288337
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper discusses the influence of fabrication imperfections and absorption on high contrast grating (HCG) reflectivity and reveals that HCGs show considerable tolerance to both factors. A fully vectorial optical numerical model was used to design an HCG for use as the top mirror of a 980 nm GaAs-based vertical-cavity surface-emitting laser. Parameters providing a high degree of reflectivity were determined with special attention to optimizing the low refractive index layer.
引用
收藏
页码：3853 / 3858
页数：6
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