Optical and mechanical characterization of evaporated SiO2 layers. Long-term evolution

被引:34
|
作者
Scherer, K
Nouvelot, L
Lacan, P
Bosmans, R
机构
[1] Essilor International, St. Maur, 94106
来源
APPLIED OPTICS | 1996年 / 35卷 / 25期
关键词
SiO2; optical thin films; stress measurements; aging; IR spectroscopy; nanoindentation; hardness; optical characterization; evaporation;
D O I
10.1364/AO.35.005067
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Numerous characterizations were performed on 120-nm thick evaporated SiO2 layers in order to understand how their features change as a function of deposition conditions and time. Density decreases with increasing deposition pressure. It governs all the layer properties (refractive index, hardness, and stress). In situ stress measurements show that stress can be divided into intrinsic and water-induced components, respectively linked to local density (outside the pores) and porosity. Intrinsic stress increase with decreasing pressure is explained by a diminution of the Si-O-Si bond angle (IR measurements). Long-term evolution is characterized by stress relaxation related to Si-O-Si strained bond hydrolysis. (C) 1996 Optical Society of America
引用
收藏
页码:5067 / 5072
页数:6
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