Growth, Electrical Characterization, and Electroluminescence of GaN/SiC Heterojunction Diodes and Bipolar Transistors Fabricated on SiC Off-Axis Substrates

被引:3
|
作者
Miyake, Hiroki [1 ]
Amari, Koichi [1 ]
Kimoto, Tsunenobu [1 ,2 ]
Suda, Jun [1 ]
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Kyoto 6158510, Japan
[2] Kyoto Univ, PESEC, Kyoto 6158510, Japan
关键词
LOW V-CESAT; CURRENT GAIN; GAN; SURFACE; BJTS; CAPABILITY; EMITTER;
D O I
10.7567/JJAP.52.124102
中图分类号
O59 [应用物理学];
学科分类号
摘要
The growth, electrical characterization, and electroluminescence (EL) of GaN/SiC heterojunction bipolar transistors (HBTs) are presented. GaN grown on off-axis SiC by molecular beam epitaxy showed step bunching owing to the large off-angle of SiC substrates, which contributed to the annihilation of edge dislocations. We investigated the impact of base doping concentration and SiC polytype (4H and 6H) on the characteristics of GaN/SiC heterojunction diodes. By utilizing S reduced doping concentration of 1 x 10(18)cm(-3) instead of 1 x 10(19) cm(-3), we suppressed the tunneling current via interface traps, resulting in an improved rectifying behavior in the diodes. Capacitance-voltage (C-V) and EL characteristics revealed that the band lineup of GaN/SiC is of type II, and 6H-SiC is better for electron injection. In accordance with diode characteristics, the fabricated GaN/SiC HBTs showed an improved common-base current gain of 0.03 by employing a reduced base doping concentration of 1 x 10(18) cm(-3) and 6H-SiC, whereas a current gain below 1 x 10(-4) was obtained in the HBTs with a base doping concentration of 1 x 10(19) cm(-3). (C) 2013 The Japan Society of Applied Physics
引用
收藏
页数:9
相关论文
共 50 条
  • [1] GaN/SiC heterojunction bipolar transistors
    Schaff, WJ
    Wu, H
    Praharaj, CJ
    Murphy, M
    Eustis, T
    Foutz, B
    Ambacher, O
    Eastman, LF
    [J]. SOLID-STATE ELECTRONICS, 2000, 44 (02) : 259 - 264
  • [2] GaN/SiC heterojunction bipolar transistors
    Torvik, JT
    Pankove, JI
    Van Zeghbroeck, B
    [J]. SOLID-STATE ELECTRONICS, 2000, 44 (07) : 1229 - 1233
  • [3] Growth of SiC layers on off-axis 4H-SiC substrates
    Pecz, B
    Toth, L
    Radnoczi, G
    Hallin, C
    Janzen, E
    [J]. MICROSCOPY OF SEMICONDUCTING MATERIALS 1997, 1997, (157): : 319 - 322
  • [4] Electron injection from GaN to SiC and fabrication of GaN/SiC heterojunction bipolar transistors
    Suda, Jun
    Nakano, Yuki
    Shimada, Syouta
    Amari, Kouichi
    Kimoto, Tsunenobu
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2005, PTS 1 AND 2, 2006, 527-529 : 1545 - 1548
  • [5] Electrical characterization of GaN/SiC n-p heterojunction diodes
    Torvik, JT
    Leksono, M
    Pankove, JI
    Van Zeghbroeck, B
    Ng, HM
    Moustakas, TD
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (11) : 1371 - 1373
  • [6] Electrical characterization of Schottky diodes fabricated on SiC epitaxial layers grown on porous SiC substrates
    Kuznetsov, NI
    Mynbaeva, MG
    Melnychuk, G
    Dmitriev, VA
    Saddow, SE
    [J]. APPLIED SURFACE SCIENCE, 2001, 184 (1-4) : 483 - 486
  • [7] The mechanism of cubic SiC nucleation on off-axis substrates
    Hallin, C
    Konstantinov, AO
    Kordina, O
    Janzen, E
    [J]. SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 85 - 88
  • [8] Direct growth of GaN on off-oriented SiC (0001) by molecularbeam epitaxy for GaN/SiC heterojunction bipolar transistor
    Nakano, Y
    Suda, J
    Kimoto, T
    [J]. PHYSICA STATUS SOLIDI C - CONFERENCES AND CRITICAL REVIEWS, VOL 2, NO 7, 2005, 2 (07): : 2208 - 2211
  • [9] Photoelastic Characterization of Residual Strain Distribution in Commercial Off-Axis SiC Substrates
    Masayuki Fukuzawa
    Kazuki Kanamoto
    [J]. Journal of Electronic Materials, 2020, 49 : 5161 - 5166
  • [10] Photoelastic Characterization of Residual Strain Distribution in Commercial Off-Axis SiC Substrates
    Fukuzawa, Masayuki
    Kanamoto, Kazuki
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 2020, 49 (09) : 5161 - 5166