Plasma source emits bright extreme-ultraviolet light

被引:0
|
作者
不详
机构
来源
LASER FOCUS WORLD | 1999年 / 35卷 / 05期
关键词
D O I
暂无
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:11 / 11
页数:1
相关论文
共 50 条
  • [1] EXTREME-ULTRAVIOLET EXPLORER BRIGHT SOURCE LIST
    MALINA, RF
    MARSHALL, HL
    ANTIA, B
    CHRISTIAN, CA
    DOBSON, CA
    FINLEY, DS
    FRUSCIONE, A
    GIROUARD, FR
    HAWKINS, I
    JELINSKY, P
    LEWIS, JW
    MCDONALD, JS
    MCDONALD, K
    PATTERER, RJ
    SABA, VW
    SIRK, MM
    STROOZAS, BA
    VALLERGA, JV
    VEDDER, PW
    WIERCIGROCH, A
    BOWYER, S
    [J]. ASTRONOMICAL JOURNAL, 1994, 107 (02): : 751 - 764
  • [2] Laser-produced plasma light source for extreme-ultraviolet lithography applications
    Abhari, Reza S.
    Rollinger, Bob
    Giovannini, Andrea Z.
    Morris, Oran
    Henderson, Ian
    Ellwi, Samir S.
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [3] Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography
    Fujimoto, Junichi
    Abe, Tamotsu
    Tanaka, Satoshi
    Ohta, Takeshi
    Hori, Tsukasa
    Yanagida, Tatsuya
    Nakarai, Hiroaki
    Mizoguchi, Hakaru
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [4] Tailoring extreme-ultraviolet light
    Taro Sekikawa
    Kenichi L. Ishikawa
    [J]. Nature Photonics, 2017, 11 : 209 - 210
  • [5] NEW LASER-PLASMA SOURCE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
    JIN, F
    RICHARDSON, M
    [J]. APPLIED OPTICS, 1995, 34 (25): : 5750 - 5760
  • [6] Compact intense extreme-ultraviolet source
    Major, B.
    Ghafur, O.
    Kovacs, K.
    Varju, K.
    Tosa, V
    Vrakking, M. J. J.
    Schuette, B.
    [J]. OPTICA, 2021, 8 (07): : 960 - 965
  • [7] Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography
    Klosner, MA
    Bender, HA
    Silfvast, WT
    Rocca, JJ
    [J]. OPTICS LETTERS, 1997, 22 (01) : 34 - 36
  • [8] Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves
    Abramov, I. S.
    Gospodchikov, E. D.
    Shalashov, A. G.
    [J]. PHYSICAL REVIEW APPLIED, 2018, 10 (03):
  • [9] Extreme-ultraviolet source specifications: tradeoffs and requirements
    Moors, Roel
    Banine, Vadim
    Swinkels, Geert
    Wortel, Frans
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [10] DETECTION OF AN EXTREME-ULTRAVIOLET SOURCE IN SOUTHERN SKY
    HENRY, P
    BOWYER, S
    RAPLEY, CG
    CULHANE, JL
    [J]. ASTROPHYSICAL JOURNAL, 1976, 209 (01): : L29 - L33