Pulsed laser deposition process of PLZT thin films using an infrared Nd: YAG laser

被引:3
|
作者
García, T
de Posada, E
Bartolo-Pérez, P
Peña, JL
Diamant, R
Calderón, F
Pelaíz, A
机构
[1] Univ Nacl Autonoma Mexico, CCADET, Mexico City 04510, DF, Mexico
[2] Univ Havana, IMRE, Fac Phys, Havana, Cuba
[3] CINVESTAV, IPN, Dept Appl Phys, Merida, Mexico
[4] UAC, Programa Corros Golfo Mexico, Compeche, Mexico
关键词
laser ablation; PLD; texture; PLZT; thin films; XPS;
D O I
10.1016/j.apsusc.2005.05.062
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Pulsed laser depositions of PLZT thin films were performed using an Nd:YAG (1064 nm) laser. The growths took place in vacuum or in an oxygen background. Room temperature and 500 degrees C were the used substrate temperatures. The X-ray diffraction analysis revealed a preferential crystallographic orientation in the films grown tit room temperature in vacuum. Such result is discussed. The velocity distribution functions of the species in the plasma plume were obtained from a time of flight study using optical emission spectroscopy. The maximums of these distributions functions fall around 10(6) cm/s, equivalent to an energy range of 18-344 eV. Ionic species of heavy elements (like lead) achieved higher velocities than other lighter species. This result is linked to the creation of an accelerating spatial charge and to the thermal nature of the target material extraction that allows some elements to be released first than others. Chemical state variations of the elements present in the films were analyzed. Under these different growing conditions, lead chemical states varied the most. (c) 2005 Published by Elsevier B.V.
引用
收藏
页码:3783 / 3788
页数:6
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