Raman investigation of SiC polytypes

被引:10
|
作者
Nakashima, S
Harima, H
机构
[1] Department of Applied Physics, Graduated School of Osaka University, Suita, Osaka 565
来源
关键词
D O I
10.1002/1521-396X(199707)162:1<39::AID-PSSA39>3.0.CO;2-L
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It has been recognized that Raman scattering spectroscopy is a powerful tool to characterize SiC crystals non-destructively. We review recent significant developments in the use of Raman scattering to study structural and electronic properties of SiC crystals. The areas to be discussed in the first part include polytype identification: evaluation of stacking disorder and ion-implantation damages, and stress evaluation. The Raman scattering by electronic transitions is discussed in the second pare of this article. We concentrate on the plasmon LO-phonon coupled modes whose spectral profiles are used to evaluate the carrier concentration and mobility. Anisotropic electronic properties of alpha-SiC and characteristics of heavily doped crystals are discussed. Semiconductor-to-metal transition and Fano interference effect are also treated.
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页码:39 / 64
页数:26
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