Templated self-assembly of block copolymers for nanolithographic applications

被引：0
|
作者：
Ross, CA
Cheng, JY
Ilievski, F
Mayes, AM
Thomas, EL
Smith, HI
Vancso, GJ
机构：
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[3] Univ Twente, Fac Chem Technol, Enschede, Netherlands
[4] Univ Twente, MESA Res Inst, Enschede, Netherlands
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 230卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
348-POLY
引用
收藏
页码：U4160 / U4160
页数：1
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