Stability of electron emission current in hydrogen-free diamond-like carbon deposited by plasma enhanced chemical vapor deposition

被引:16
|
作者
Chung, SJ
Moon, JH
Park, KC
Oh, MH
Milne, WI
Jang, J
机构
[1] KOREA ADV INST SCI & TECHNOL,SEOUL,SOUTH KOREA
[2] UNIV CAMBRIDGE,CAMBRIDGE CB2 1PZ,ENGLAND
关键词
D O I
10.1063/1.366286
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the electron emission characteristics of the hydrogen-free diamondlike carbon (DLC) and conventional DLC films. The electron emission current of conventional DLC increases at first and then decreases continuously with bias stress time. The emission current of the hydrogen-free DLC, deposited by the layer-by-layer technique, increases at first and then stabilizes with increasing stress time. The resistivity of the hydrogen-free DLC decreases after long bias stress, and that appears to be due to the changes in the density of states in the gap of the hydrogen-free DLC. (C) 1997 American Institute of Physics.
引用
收藏
页码:4047 / 4050
页数:4
相关论文
共 50 条
  • [1] Deposition of hydrogen-free diamond-like carbon film by plasma enhanced chemical vapor deposition
    Park, KC
    Moon, JH
    Jang, J
    Oh, MH
    [J]. APPLIED PHYSICS LETTERS, 1996, 68 (25) : 3594 - 3595
  • [2] Diamond-like carbon films deposited on polycarbonates by plasma-enhanced chemical vapor deposition
    Guo, C. T.
    [J]. THIN SOLID FILMS, 2008, 516 (12) : 4053 - 4058
  • [3] Diamond-like carbon films deposited on polymers by plasma-enhanced chemical vapor deposition
    Cuong, NK
    Tahara, M
    Yamauchi, N
    Sone, T
    [J]. SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 1024 - 1028
  • [4] Diamond-like carbon films deposited by electron beam excited plasma chemical vapor deposition
    Ban, M
    Ryoji, M
    Hasegawa, T
    Mori, Y
    Fujii, S
    Fujioka, J
    [J]. DIAMOND AND RELATED MATERIALS, 2002, 11 (07) : 1353 - 1359
  • [5] Characterization of hydrogen-free diamond-like carbon films deposited by pulsed plasma technology
    Wang, DY
    Chang, CL
    Ho, WY
    [J]. THIN SOLID FILMS, 1999, 355 : 246 - 251
  • [6] Fluorinated amorphous diamond-like carbon films deposited by plasma-enhanced chemical vapor deposition
    Yu, GQ
    Tay, BK
    Sun, Z
    [J]. SURFACE & COATINGS TECHNOLOGY, 2005, 191 (2-3): : 236 - 241
  • [7] Fracture resistance enhancement of diamond-like carbon/nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor deposition
    Qi, J
    Lai, KH
    Bello, I
    Lee, CS
    Lee, ST
    Luo, JB
    Wen, SZ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (01): : 130 - 135
  • [8] Stability of field emission current for hydrogen-free diamond-like carbon films prepared by layer-by-layer technique
    Moon, JH
    Chung, SJ
    Milne, WI
    Oh, MH
    Jang, J
    [J]. IVMC'97 - 1997 10TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 1997, : 455 - 459
  • [9] Annealing of hydrogenated diamond-like carbon films deposited on ground electrode of plasma enhanced chemical vapor deposition system
    Yokota, Katsuhiro
    Nakatani, Takahiro
    Miyashita, Fumiyoshi
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (9A): : 5901 - 5907
  • [10] Annealing of hydrogenated diamond-like carbon films deposited on ground electrode of plasma enhanced chemical vapor deposition system
    Faculty of Engineering and HRC, Kansai University, Suita, Osaka 564-8680, Japan
    不详
    [J]. Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 1600, 9 A (5901-5907):