Determination of trace impurities in high purity gallium by inductively coupled plasma mass spectrometry

被引:0
|
作者
Yue, XY
Cai, SQ [1 ]
Shao, RZ
Liu, YL
Lu, YQ
机构
[1] Beijing Gen Res Inst Non Ferrous Met, Beijing 100088, Peoples R China
[2] Univ Sci & Technol Beijing, Beijing 100088, Peoples R China
关键词
inductively coupled plasma mass spectrometry; high purity gallium; trace impurities; matrix effect; internal standard; solvent extraction;
D O I
暂无
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A method for the determination of trace impurities in high purity gallium by inductively coupled plasma mass spectrometry (ICP-MS) was developed. The interference from the matrix of gallium on ICP-MS determination was discussed. Using Rh as internal standard could effectively eliminate signal suppression effect induced by matrix. While using isopropyl ether as extractant the matrix gallium was extracted into organic phase. The detection limits are 0.006 similar to 0.082 mug/L; Recoveries of standard addition are 86.8% similar to 121.4%; precision is better than 10%. The method has been applied for the determination of trace impurities in gallium samples with purity of 99.99% similar to 99.99999%.
引用
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页码:1307 / 1310
页数:4
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