Inductively coupled plasmas sustained by an internal oscillating current

被引：8
|
作者：
Tsakadze, EL
Ostrikov, KN
Xu, S
Storer, R
Sugai, H
机构：
[1] Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore
[2] Nagoya Univ, Dept Elect Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[3] Flinders Univ S Australia, Sch Chem Phys & Earth Sci, Adelaide, SA 5001, Australia
[4] Nanyang Technol Univ, Dept Elect & Elect Engn, Singapore 639798, Singapore
来源：
JOURNAL OF APPLIED PHYSICS | 2002年 / 91卷 / 04期
关键词：
D O I：
10.1063/1.1430893
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A global electromagnetic model of an inductively coupled plasma sustained by an internal oscillating current sheet in a cylindrical metal vessel is developed. The electromagnetic field structure, profiles of the rf power transferred to the plasma electrons, electron/ion number density, and working points of the discharge are studied, by invoking particle and power balance. It is revealed that the internal rf current with spatially invariable phase significantly improves the radial uniformity of the electromagnetic fields and the power density in the chamber as compared with conventional plasma sources with external flat spiral inductive coils. This configuration offers the possibility of controlling the rf power deposition in the azimuthal direction. (C) 2002 American Institute of Physics.
引用
收藏
页码：1804 / 1813
页数：10
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