Instability and dewetting of polystyrene/polyhedral oligomeric silsesquioxane (POSS) bilayer films

被引：0
|
作者：
Paul, Rituparna [1 ]
Swift, Michael C. [1 ]
Hottle, John R. [1 ]
Esker, Alan R. [1 ]
机构：
[1] Virginia Tech, Dept Chem 0212, Macromol & Interfaces Inst, Blacksburg, VA 24061 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 231卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
458-PMSE
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页数：2
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