Characteristics of a Single-Layer Graphene Field Effect Transistor with UV/Ozone Treatment

被引:11
|
作者
Liu, W. J. [1 ]
Tran, X. A. [1 ]
Liu, X. B. [2 ]
Wei, J. [3 ]
Yu, H. Y. [4 ]
Sun, X. W. [1 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Div Microelect, Singapore 639798, Singapore
[2] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore
[3] ASTAR, Singapore Inst Mfg Technol, Singapore 638075, Singapore
[4] South Univ Sci & Technol, Dept Elect & Comp Engn, Shenzhen 518055, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
RAMAN-SPECTROSCOPY; ULTRAVIOLET OZONE; SUBSTRATE; DEFECTS; DEVICE; FILMS;
D O I
10.1149/2.005301ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The performance of a single-layer graphene field effect transistor treated with UV/ozone at various temperatures is studied. It is observed that the number of the defects in graphene sheet increases with the UV/ozone treatment time, evidenced by Raman spectra. Moreover, the UV/ozone treatment dopes graphene into p-type as the time increases, which is consistent with the electric transfer measurements. With the increase in the UV/ozone treatment time, the mobility of graphene transistor degrades, and the degradation accelerates with the increase in temperature. We further verified by XPS measurement that the oxygen related carbon group O=C-O formation is the main cause for the mobility degradation. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.005301ssl] All rights reserved.
引用
收藏
页码:M1 / M4
页数:4
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