Formation of MnSb during the growth of MnSi layers in the presence of an Sb flux

被引:1
|
作者
Matsuda, K
Takano, Y
Kuwabara, K
Tatsuoka, H
Kuwabara, H
Suzuki, Y
Fukuda, Y
Hashimoto, S
Yan, Y
Pennycook, SJ
机构
[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
[2] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
[3] Kokan Keisoku KK, Kawasaki, Kanagawa 2100855, Japan
[4] Natl Renewable Energy Lab, Golden, CO 80401 USA
[5] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
关键词
D O I
10.1063/1.1461063
中图分类号
O59 [应用物理学];
学科分类号
摘要
Structural and compositional analyses of a MnSi layer have been performed to elucidate the growth mechanism. The MnSi layer was grown by reactive deposition epitaxy in the presence of an Sb flux. The existence of Sb was found at the MnSi/Si interface and on the surface of MnSi layer by secondary ion mass spectrometry. In addition, x-ray photoelectron spectroscopy measurement shows that MnSb is formed on the surface of the grown MnSi layer. On the atomic scale, scanning transmission electron microscopy observations reveal the existence of an Sb-Mn-Sb structure at the interface between the MnSi layer and the Si substrate. The formation of the MnSb plays an important role for the improvement of crystalline quality of the silicide layer, acting both as a surfactant and as a compliant substrate for stress relief. (C) 2002 American Institute of Physics.
引用
收藏
页码:4932 / 4935
页数:4
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