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- [1] Performance and optical gain characteristic of InGaN MQW laser diodesJOURNAL OF LUMINESCENCE, 2000, 87-9 : 135 - 139Kneissl, M论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAVan de Walle, CG论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USABour, DP论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USARomano, LT论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAGoddard, LL论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAMaster, CP论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USANorthrup, JE论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAJohnson, NM论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA
- [2] CW operation of InGaN MQW laser diodesPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2000, 180 (01): : 139 - 147Bour, DP论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAKneissl, M论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAVan de Walle, CG论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USANorthrup, J论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USARomano, LT论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USATeepe, M论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAWood, R论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USASchmidt, T论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USAJohnson, NM论文数: 0 引用数: 0 h-index: 0机构: Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA
- [3] Plasmonic cladding InGaN MQW laser diodesNOVEL IN-PLANE SEMICONDUCTOR LASERS X, 2011, 7953Perlin, P.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandHolc, K.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandSarzynski, M.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandLeszczynski, M.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandCzernecki, R.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandMarona, L.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandWisniewski, P.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland TopGaN Ltd, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandCywinski, G.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandSkierbiszewski, C.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandBockowski, M.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandGrzegory, I.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, PolandSuski, T.论文数: 0 引用数: 0 h-index: 0机构: Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland Inst High Pressure Phys PAS, Sokolowska 29-37, PL-01142 Warsaw, Poland
- [4] Influence of barrier growth schemes on the structural properties and thresholds of InGaN quantum well laser diodesJOURNAL OF CRYSTAL GROWTH, 2014, 391 : 46 - 51论文数: 引用数: h-index:机构:Mogilatenko, A.论文数: 0 引用数: 0 h-index: 0机构: Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany论文数: 引用数: h-index:机构:Zeimer, U.论文数: 0 引用数: 0 h-index: 0机构: Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, GermanyEinfeldt, S.论文数: 0 引用数: 0 h-index: 0机构: Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, GermanyWeyers, M.论文数: 0 引用数: 0 h-index: 0机构: Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, GermanyKneissl, M.论文数: 0 引用数: 0 h-index: 0机构: Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany Tech Univ Berlin, Inst Festkorperphys, Berlin, Germany Leibniz Inst Hoshstfrequenztech, Ferdinand Braun Inst, Berlin, Germany
- [5] Nitride laser diodes with InGaN based MQW structuresNITRIDE SEMICONDUCTORS, 1998, 482 : 1157 - 1167Sugiura, L论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, JapanNishio, J论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, JapanOnomura, M论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, JapanNunoue, S论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, JapanItaya, K论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, JapanIshikawa, M论文数: 0 引用数: 0 h-index: 0机构: Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan Toshiba Corp, R&D Ctr, Adv Semicond Devices Res Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan
- [6] Influence of MQW growth temperature and post-epitaxial annealing on luminescence and laser properties of InGaN/GaN MQW heterostructures grown by MOCVD on sapphire substratesJOURNAL OF CRYSTAL GROWTH, 2005, 275 (1-2) : E1047 - E1051Gurskii, A. L.论文数: 0 引用数: 0 h-index: 0机构: Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSPavlovskii, V. N.论文数: 0 引用数: 0 h-index: 0机构: Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSLutsenko, E. V.论文数: 0 引用数: 0 h-index: 0机构: Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSZubialevich, V. Z.论文数: 0 引用数: 0 h-index: 0机构: Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSYablonskii, G. P.论文数: 0 引用数: 0 h-index: 0机构: Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSKalisch, H.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Theoret Elektrotech, D-52064 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSSzymakowski, A.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Theoret Elektrotech, D-52064 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSJansen, R. H.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Theoret Elektrotech, D-52064 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSAlam, A.论文数: 0 引用数: 0 h-index: 0机构: AIXTRON AG, D-52072 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSSchineller, B.论文数: 0 引用数: 0 h-index: 0机构: AIXTRON AG, D-52072 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUSHeuken, M.论文数: 0 引用数: 0 h-index: 0机构: AIXTRON AG, D-52072 Aachen, Germany Natl Acad Sci Belarus, Stepanov Inst Phys, Minsk 220072, BELARUS
- [7] Selective MOVPE growth of InGaN/GaN MQW on microfacet GaN stripesPHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 7-8, 2011, 8 (7-8): : 2038 - 2040Tanikawa, Tomoyuki论文数: 0 引用数: 0 h-index: 0机构: Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, JapanMurase, Tasuku论文数: 0 引用数: 0 h-index: 0机构: Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, JapanHonda, Yoshio论文数: 0 引用数: 0 h-index: 0机构: Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, JapanYamaguchi, Masahito论文数: 0 引用数: 0 h-index: 0机构: Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, JapanAmano, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ, Dept Elect, Chikusa Ku, C3-1,Furo Cho, Nagoya, Aichi 4648603, Japan
- [8] MOVPE growth and characterization of InAlGaN films and InGaN/InAlGaN MQW structuresJOURNAL OF CRYSTAL GROWTH, 2008, 310 (7-9) : 1777 - 1780论文数: 引用数: h-index:机构:Svensk, O.论文数: 0 引用数: 0 h-index: 0机构: Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandTorma, P. T.论文数: 0 引用数: 0 h-index: 0机构: Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandAli, M.论文数: 0 引用数: 0 h-index: 0机构: Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandSopanen, M.论文数: 0 引用数: 0 h-index: 0机构: Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandLipsanen, H.论文数: 0 引用数: 0 h-index: 0机构: Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandOdnoblyudo, M. A.论文数: 0 引用数: 0 h-index: 0机构: Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia OptoGaN Oy, Espoo 02150, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, FinlandBougrov, V. E.论文数: 0 引用数: 0 h-index: 0机构: Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia OptoGaN Oy, Espoo 02150, Finland Helsinki Univ Technol, Micro & Nanosci Lab, FIN-02150 Espoo, Finland
- [9] Influence of the growth method on degradation of InGaN laser diodesApplied Physics Express, 2017, 10 (09):Bojarska, Agata论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandMuziol, Grzegorz论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandSkierbiszewski, Czeslaw论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandGrzanka, Ewa论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland TopGaN Ltd., Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandWiśniewski, Przemyslaw论文数: 0 引用数: 0 h-index: 0机构: TopGaN Ltd., Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandMakarowa, Irina论文数: 0 引用数: 0 h-index: 0机构: TopGaN Ltd., Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandCzernecki, Robert论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland TopGaN Ltd., Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandSuski, Tadek论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, PolandPerlin, Piotr论文数: 0 引用数: 0 h-index: 0机构: Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland TopGaN Ltd., Sokolowska 29/37, Warsaw,01-142, Poland Institute of High Pressure Physics'Unipress', Sokolowska 29/37, Warsaw,01-142, Poland
- [10] Influence of growth temperature on GaN:Cr incorporation and structural properties in MOVPEJOURNAL OF CRYSTAL GROWTH, 2009, 312 (01) : 1 - 9Cho, Y. S.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyHardtdegen, H.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyKaluza, N.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germanyvon der Ahe, M.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyBreuer, U.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, Cent Div Analyt Chem ZCH, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyBochem, H. -P.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyRuterana, P.论文数: 0 引用数: 0 h-index: 0机构: ENISCAEN CEA UCBN, CNRS, CIMAP, UMR 6252, F-14050 Caen, France Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanySchmalbuch, K.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany Rhein Westfal TH Aachen, VISel, D-52056 Aachen, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyWenzel, D.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany Rhein Westfal TH Aachen, VISel, D-52056 Aachen, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanySchaepers, Th.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyBeschoten, B.论文数: 0 引用数: 0 h-index: 0机构: Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany Rhein Westfal TH Aachen, VISel, D-52056 Aachen, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyGruetzmacher, D.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, GermanyLueth, H.论文数: 0 引用数: 0 h-index: 0机构: Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany Res Ctr Julich, VISel, JARA, IBN 1, D-52425 Julich, Germany