Electrode impedance effect in dual-frequency capacitively coupled plasma

被引:21
|
作者
Yamazawa, Yohei [1 ]
机构
[1] Tokyo Electron Yamanashi Ltd, Yamanashi Technol Dev Ctr, Nirasaki City, Yamanashi 4070192, Japan
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2015年 / 24卷 / 03期
关键词
plasma series resonance; nonlinear electron resonance heating; electrode impedance effect; capacitively coupled plasma; harmonic; inter-modulation distortion; ELECTRICAL CHARACTERISTICS; DISCHARGES; DRIVEN;
D O I
10.1088/0963-0252/24/3/034015
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The nonlinearity of a plasma sheath generates currents having a frequency different from the drive frequencies in a capacitively coupled plasma. We demonstrated the control of these currents together with the drive currents by adjusting the impedance of an electrode using an external circuit. Linear and nonlinear effects, caused by adjusting the impedance of the bottom electrode were observed in dual-frequency capacitively coupled plasma (DFCCP) by applying 60 MHz RF power to the top electrode and 13.56 MHz RF power to the bottom electrode. The linear effect is used to control the 60 MHz current at the bottom electrode. The nonlinear effect is used to control the self-excitation and resonant growth of currents originating from the plasma nonlinearity. In particular, in addition to the harmonics of one of the drive frequencies, we also controlled the growth of inter-modulation distortions which are characteristic nonlinear currents in DFCCP. Changes in the currents at both the top and bottom electrodes were simultaneously obtained. The currents at the bottom electrode exhibit two types of peak, one of which originates from the series resonance between the plasma and the electrode impedance, and the other is caused by increases in the amplitudes of the other currents. A simplified nonlinear model including the dual-frequency input is proposed to explain the observed growth. Our results indicate that resonance is possible even below 100 MHz, and that the resonance is controllable using an external circuit.
引用
收藏
页数:10
相关论文
共 50 条
  • [1] Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma
    Rauf, Shahid
    Tian, Peng
    Kenney, Jason
    Dorf, Leonid
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2022, 40 (03):
  • [2] Particle simulation of a magnetized dual-frequency capacitively coupled plasma
    Kim, Daeho
    Chang, Hyonu
    Ryu, Chang-Mo
    [J]. COMPUTER PHYSICS COMMUNICATIONS, 2007, 177 (1-2) : 125 - 125
  • [3] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    王虹宇
    姜巍
    孙鹏
    赵双云
    李阳
    [J]. Plasma Science and Technology, 2016, (02) : 143 - 146
  • [4] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    Wang Hongyu
    Jiang Wei
    Sun Peng
    Zhao Shuangyun
    Li Yuang
    [J]. PLASMA SCIENCE & TECHNOLOGY, 2016, 18 (02): : 143 - 146
  • [5] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    王虹宇
    姜巍
    孙鹏
    赵双云
    李阳
    [J]. PlasmaScienceandTechnology., 2016, 18 (02) - 146
  • [6] CHF3 dual-frequency capacitively coupled plasma
    Hu Jia
    Xu Yi-Jun
    Ye Chao
    [J]. ACTA PHYSICA SINICA, 2010, 59 (04) : 2661 - 2665
  • [7] Study on Dual-Frequency Imaging of Capacitively Coupled Electrical Impedance Tomography: Frequency Optimization
    Jiang, Yandan
    Huang, Junchao
    Ji, Haifeng
    Wang, Baoliang
    Huang, Zhiyao
    Soleirnani, Manuchehr
    [J]. IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2022, 71 : 1 - 1
  • [8] Particle simulation of a magnetically enhanced dual-frequency capacitively coupled plasma
    Kim, D. H.
    Ryu, C-M
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (01)
  • [9] Dual-frequency capacitively coupled chlorine discharge
    Huang, Shuo
    Gudmundsson, J. T.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2015, 24 (01):
  • [10] Electrical breakdown in dual-frequency capacitively coupled plasma: a collective simulation
    Wu, Hao
    Zhou, Youyou
    Gao, Jiamao
    Peng, Yanli
    Wang, Zhijiang
    Jiang, Wei
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2021, 30 (06):