State Estimation for Integrated Moving Average Processes in High-Mix Semiconductor Manufacturing

被引:5
|
作者
Wang, Jin [1 ]
He, Q. Peter [2 ]
Edgar, Thomas F. [3 ]
机构
[1] Auburn Univ, Dept Chem Engn, Auburn, AL 36849 USA
[2] Tuskegee Univ, Dept Chem Engn, Tuskegee, AL 36088 USA
[3] Univ Texas Austin, Dept Chem Engn, Austin, TX 78712 USA
基金
美国国家科学基金会;
关键词
TO-RUN CONTROL; MULTISCALE SYSTEMS; IDENTIFICATION; CONTROLLER; PERFORMANCE; STABILITY; DESIGN; MODELS;
D O I
10.1021/ie401537d
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
High-mix manufacturing in the semiconductor industry has driven the development of several nonthreaded state estimation methods. These methods share information among different manufacturing contexts and avoid data segregation that threaded methods require. However, existing nonthreaded methods consider either white noise disturbance or integrated white noise disturbance. In this work, we derive the state-space representation of the nonthreaded state estimation problem. The derivation considers an integrated moving average (IMA) disturbance, which is more realistic than white noise or integrated white noise disturbance for most semiconductor processes. In addition, the derivation considers the fact that if a context item is not involved in a process run, then its state does not change. Finally, we propose an improved nonthreaded state estimation method based on the Kalman filter. Simulations examples are given to demonstrate the performance of the proposed method, which is also compared with the existing Kalman filter approach, which considers integrated white noise only. A practical modification of the improved Kalman filter is also proposed to significantly simplify the implementation while providing comparable state estimation performance.
引用
收藏
页码:5194 / 5204
页数:11
相关论文
共 50 条
  • [1] State estimation in high-mix semiconductor manufacturing
    Wang, Jin
    He, Q. Peter
    Edgar, Thomas F.
    [J]. JOURNAL OF PROCESS CONTROL, 2009, 19 (03) : 443 - 456
  • [2] A new state estimation method for high-mix semiconductor manufacturing processes
    Prabhu, Amogh V.
    Edgar, Thomas F.
    [J]. JOURNAL OF PROCESS CONTROL, 2009, 19 (07) : 1149 - 1161
  • [3] Improved state estimation for high-mix semiconductor manufacturing
    Wang, Jin
    He, Q. Peter
    Edgar, Thomas F.
    [J]. 2013 AMERICAN CONTROL CONFERENCE (ACC), 2013, : 6649 - 6654
  • [4] Run-to-run control and state estimation in high-mix semiconductor manufacturing
    Bode, C. A.
    Wang, J.
    He, Q. P.
    Edgar, T. F.
    [J]. ANNUAL REVIEWS IN CONTROL, 2007, 31 (02) : 241 - 253
  • [5] A G&P EWMA algorithm for high-mix semiconductor manufacturing processes
    Chang, Chun-Cheng
    Pan, Tian-Hong
    Wong, David Shan-Hill
    Jang, Shi-Shang
    [J]. JOURNAL OF PROCESS CONTROL, 2011, 21 (01) : 28 - 35
  • [6] Survey on Run-to-Run Control Algorithms in High-Mix Semiconductor Manufacturing Processes
    Tan, Fei
    Pan, Tianhong
    Li, Zhengming
    Chen, Shan
    [J]. IEEE TRANSACTIONS ON INDUSTRIAL INFORMATICS, 2015, 11 (06) : 1435 - 1444
  • [7] A Survey of Run-to-Run Control Algorithms for High-mix Semiconductor Manufacturing Processes
    Ma Ming-Da
    Zeng Xian-Lin
    Duan Guang-Ren
    [J]. 2011 30TH CHINESE CONTROL CONFERENCE (CCC), 2011, : 5474 - 5479
  • [8] MODELING COMPLEX PROCESSABILITY CONSTRAINTS IN HIGH-MIX SEMICONDUCTOR MANUFACTURING
    Ben Amira, Ahmed
    Lepelletier, Guillaume
    Vialletelle, Philippe
    Dauzere-Peres, Stephane
    Yugma, Claude
    Lalevee, Philippe
    [J]. 2013 WINTER SIMULATION CONFERENCE (WSC), 2013, : 3719 - 3730
  • [9] Run to Run Control Based on Adaptive Cluster Method for High-mix Semiconductor Manufacturing Processes
    Tian-Hong Pan
    Bi-Qi Sheng
    Chun-Cheng Chang
    David Shan-Hill Wong
    Shi-Shang Jang
    [J]. PROCEEDINGS OF THE 29TH CHINESE CONTROL CONFERENCE, 2010, : 3428 - 3431
  • [10] ANOVA model based moving window approach for RtR control in high-mix semiconductor manufacturing industry
    Ling, D.
    Zheng, Y.
    Fang, H. J.
    Fan, H. J.
    Zhao, J.
    [J]. 2013 EUROPEAN CONTROL CONFERENCE (ECC), 2013, : 3949 - 3954